Contaminated surface polishing -washing detergent composition

ABSTRACT

A contaminated surface polishing-washing detergent composition comprises a polishing media and a dispersion medium wherein at least a part of the polishing media is made of a fine powder of an RB ceramic and/or CRB ceramic. The composition is effective in polishing-washing the surfaces of a precision-worked base material, and after the polishing-washing, the particles of metal oxides and the particles of removed burrs and the cutting metal chips are simply separated from the composition by use of the difference in specific gravity to re-use it by recycling.

TECHNICAL FIELD

[0001] The invention relates to a contaminated surface polishing-washingdetergent composition for removing the particles of oxides formed uponworking and the particles of removed burrs and cutting metal chips thatare left on precision-worked surfaces such as of turbine blades.

BACKGROUND OF THE INVENTION

[0002] The turbine blades are formed, by electrical discharge machining,on the surfaces thereof with a concave-shaped pattern receiving a fluid.At the peripheries of the discharge-machined, concave-shaped pattern,there are left the particles of oxides of an alloy used as a basematerial and the particles of removed burrs and cutting metal chips. Inorder to remove the particles of the metal oxides of the alloy and theburrs and the cutting metal chips, it has been usual thatpolishing-washing is carried out by utilizing a water jet or ultrasonicwaves while using a polishing media.

[0003] The polishing media is in the form of fine particles and isselected from silica, calcium oxide, aluminium oxide, silicon nitride,silicon carbide, cesium oxide, synthetic or natural diamond, metalsilicides, tungsten oxide, titanium nitride, titanium oxide, other typesof materials that are harder than an alloy used as a constituent basematerial for turbine blade, and mixtures thereof.

[0004] However, there arise the problems that if a hard polishing mediasuch as of diamond particles is used, the particles may be intruded intothe surfaces of the base material for the turbine blade, and thatpolishing may not proceed satisfactorily when using a relatively softpolishing media.

[0005] Further, the particles of metal oxides of an alloy used as a basematerial for the turbine blade or the particles of removed burrs and thecutting metal chips have substantially the same specific gravity as thepolishing media, with the attendant problem that it is difficult toseparate the particles of the metal oxides and the particles of theremoved burrs and the cutting metal chips from a polishing mediasolution composition containing the particles of the metal oxides of thealloy and the particles of the removed burrs and cutting metal chips.Further, since the specific gravity of those media is high in respect towater as a fluid, there is the problem that upon making a mixed fluidcontaining the media, it is difficult to obtain a mixture in which themedia keeps mixed uniformly in the long term since the media starts toseparate indefinably due to different specific gravity and depending onthe rate of the media contained in the mixture.

SUMMARY OF THE INVENTION

[0006] In the practice of the invention, there is provided acontaminated surface polishing-washing detergent composition using ahard, light RB ceramic and/or CRB ceramic, which composition isre-usable by recycling as a polishing media solution composition afterefficient polishing-washing of the surface of a precision-worked basematerial and removal of the particles of metal oxides and the particlesof removed burrs and the cutting metal chips in a simple way from thepolishing media solution composition after the polishing-washing byutilizing the difference in specific gravity.

[0007] The contaminated surface polishing-washing detergent compositionof the invention could solve the above problems, in which an RB ceramicand/or CRB ceramic in the form of a fine power whose bulk specificgravity ranges about 1.25 to 1.35 (g·cm⁻³) (the bulk specific gravity ismeasured such that the test piece described in JIS R 1601.4 is subjectedto the measuring method of bulk specific gravity described in JIS R7222.7 and it is to be noted that the RB ceramic and/or CRB ceramic isso porous that only a bulk specific gravity can be measured) is used asa polishing media.

[0008] More particularly, the RB ceramic and/or CRB ceramic is porous,has such a hardness that the Vickers' hardness is about 400 or over, canbe divided into a fine powder having a size of approximately 1 μm, isnot so hard as diamond and is not thus intruded into an alloy in thesurfaces of the base material, and is small in bulk specific gravity.Accordingly, if such a ceramic is dispersed in an aqueous surfactantsolution having substantially the same specific gravity to provide apolishing media solution composition, the particles of metal oxides andparticles of removed burrs and the cutting metal chips can be settledonly by allowing the solution to stand after polishing-washing. Theseparation of the resultant precipitate by filtration makes it possibleto provide a refreshed polishing media solution composition forrecycling.

[0009] The RB ceramic and CRB ceramic used in the invention are thosematerials prepared according to the following process.

[0010] The porous carbon material that is obtained by using rice branproduced at 900,000 tons per year in Japan and at 33,000,000 tons peryear in the world is known according to the studies made by KazuoHokkirigawa, one of co-inventors of this application (see “FunctionalMaterials” May 1997, Vol. 17, No. 5. Pp. 24 to 28).

[0011] In this literature, reference is made to a carbon material(hereinafter referred to as RB ceramic) and the preparation thereof, inwhich the material is obtained by blending and kneading defatted branderived from rice bran and a thermosetting resin, followed by drying acompact obtained by pressure forming and subsequently baking the driedcompact in an atmosphere of an inert gas.

[0012] According to this method, the difference in contraction ratiobetween the size of the pressure formed compact and the size of thefinal molded compact obtained by baking in the inert gas atmosphere isat 25%, which makes it substantially difficult to make a precise moldedcompact. A ceramic (CRB ceramic) improved in the ratio has now beendeveloped. The RB ceramic and CRB ceramic individually have thefollowing general properties.

DETAILED DESCRIPTION OF THE INVENTION

[0013] The polishing media used in the invention should comprise fineparticles of the RB ceramic and/or CRB ceramic. In the practice of theinvention, conventional polishing media may be used in combination.

[0014] The polishing media used in combination include silica, calciumoxide, aluminium oxide, silicon nitride, silicon carbide, cesium oxide,synthetic or natural diamond, a metal silicide, tungsten oxide, titaniumnitride, titanium oxide, other types of materials that are harder than abase material constituting a body to be worked, and mixtures thereof.

[0015] The polishing-washing composition used in the invention can beused for a polishing-washing method using a water jet or ultrasonicwaves. Both polishing-washing methods are well known in the art and arenot described in detail herein.

[0016] With the contaminated surface polishing-washing detergentcomposition of the invention, when a dispersion medium containingpolishing media and obtained after polishing-washing is repeatedlyreused, the difference in specific gravity is utilized, and thus, thedispersion medium solution is allowed only to stand, whereupon theparticles of metal oxides formed during the course of working and theparticles of removed burrs and the cutting metal chips settle from thedispersion medium solution containing the polishing media. The resultantprecipitate is removed by a method such as filtration to obtain a freshpolishing media solution composition, which can be recycled.

[0017] The polishing media used in combination, such as silica, calciumoxide, aluminium oxide, silicon nitride, silicon carbide, cesium oxide,synthetic or natural diamond, a metal silicide, tungsten oxide, titaniumnitride, titanium oxide or the like, cannot be removed only by allowingthe solution to stand, and is supplemented in an amount corresponding tothat contained in the precipitate, followed by recycling in a similarway.

[0018] As is particularly shown in FIG. 1, a polishing media solutioncomposition 2 is pumped up from a storage tank 1, in which the polishingmedia solution composition 2 is placed, by means of pump 3, and workedportions 6 of a body 5 to be worked are subjected to polishing-washingby means of a water jet gun 4. The polishing media solution compositionafter the polishing-washing is collected in a temporary storage tank 7receiving a once treated polishing media solution composition. This istransferred to a standing tank 9 by means of a pump 8. In the standingtank 9, the polishing media solution composition, which contains theparticles of metal oxides and the particles of removed burrs and thecutting metal chips formed in the course of the processing over about 1to 24 hours is allowed to stand. The particles of the metal oxides andthe particles of the removed burrs and the cutting metal chips, in mostcases, have a specific gravity of approximately 4.0 to 7.0, whereas thebulk specific gravity of the RB ceramic and/or CRB ceramic used as thepolishing media of the invention is at approximately 1.3 to 1.4. Inaddition, the solvent for the polishing media used has a specificgravity of approximately 1.1 to 1.4. Eventually, a precipitate 10 isformed only of the particles of the metal oxides and the particles ofthe removed burrs and the cutting metal chips. Thereafter, a supernatantliquid portion in the standing tank 9 is recycled, by means of arecycling pump 12, to the storage tank 1 as a polishing media solutioncomposition containing the RB ceramic and/or CRB ceramic that is apolishing media of the invention. It will be noted that the precipitatemay be appropriately withdrawn from a precipitate withdrawal port 11.

[0019] Furthermore, in another embodiment, there may be used aultrasonic wave tank 7′ capable of imposing ultrasonic vibrations inplace of the water jet gun 4. The polishing media solution compositionafter having used over a given time in the ultrasonic wave tank 7′ ispassed to the standing tank 9 by means of a pump 8′. In the standingtank 9, the polishing media solution composition containing theparticles of metal oxides formed in the course of working and theparticles of removed burrs and the cutting metal chips is allowed tostand over about 1 to 24 hours, so that the particles of the metaloxides and the particles of the burrs and the cutting metal chips can beseparated therefrom.

[0020] The RB ceramic and/or CRB ceramic used as the polishing media inthe invention should preferably be one which is obtained by baking atrelative high temperatures and has a specific gravity of fromapproximately 1.2 to 1.35.

[0021] The solvent used in the invention may be any one which is able tosuspend the particles of the polishing media therein, for which water,acids, alcohols and mixtures thereof are preferably used.

[0022] Auxiliary additives may be added to the composition containingthe polishing media. Potassium chloride, ammonium chloride or acombination thereof may be used as the auxiliary additive, which notonly acts to increase the specific gravity of the solution, but also canfacilitate the polishing effect of a metal surface with a polishingmaterial.

[0023] Moreover, the final pH of the solution can be appropriatelyadjusted by addition of an acid or a base. The final solutioncomposition can be diluted by adding a solvent to the above parentsolution in an amount sufficient to obtain a desired viscosity and aratio of the solid components. The final ratio of the solid componentscan be within a range of about 5 to 50 wt %.

[0024] In the practice of the invention, surface active agents may beused in order to enhance the dispersability and washing effect. Thesurface active agents usable in the invention are selected from anionicsurface active agents, amphoteric surface active agents, nonionicsurface active agents and cationic surface active agents.

[0025] Examples of the anionic surface active agent include fatty acidsalts such as potassium laurate, potassium myristate, potassium oleateand the like, alkylsulfates such as sodium laurylsulfate, ammoniumlaurylsulfate, triethanolamine laurylsulfate and the like,alkylbenzenesulfonates such as sodium dodecylbenzenesulfonate,N-acylamino acid salts such as sodium lauroylsarcosine, potassiumlauroylsarcosine and the like, alkyl ether carboxylates such as sodiumpolyoxyethylene tridecyl ether acetate, N-acyltaurine salts such assodium N-lauroylmethyltaurine, sodium N-cocoylmethyltaurine and thelike, N-acylalanine salts such as sodium lauroylmethylalanine,sulfonates such as sodium laurylsulfoacetate, polyoxyethylene alkylether sulfates such as sodium polyoxyethylene lauryl ether sulfate,triethanolamine polyoxyethylene alkyl ether sulfate and the like,alkanesulfonates such as sodium tetradecanesulfonate, sodiumpentadecanesulfonate and the like, α olefinsulfonates such as sodiumtetradecenesulfonate, alkyl phosphates such as sodium laurylphosphate,and polyoxyethylene alkyl ether phosphates such as sodiumpolyoxyethylene lauryl ether phosphate.

[0026] Examples of the amphoteric surface active agent include aceticacid betaine-type agents such as lauryldimethylaminoacetic acid betaine,lauric acid amidopropyldimethylaminoacetic acid betaine and the like,and imidazoline-type agents such as sodium N-coconut oil fatty acidacyl-N-carboxymethyl-N-hydroxyethylethylenediamine.

[0027] Examples of the nonionic surface active agent includepolyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, andalkylalkanolamides, and the like. Examples of the cationic surfaceactive agent include alkylammonium salts such as lauryltrimethylammoniumchloride, lauryldimethylamine oxide and the like.

[0028] The surface active agents not only have stain removability as adetergent, but also enhance the dispersability of the media.

[0029] The surface active agent is preferably used in an amount of 0.5to 6 wt % based on water serving as a dispersion medium. If the amountof a surface active agent is less than 0.5 wt %, detergent power isweak. When the amount exceeds 6 wt %, rinsing properties becomeworsened. The surface active agents may be used singly or in combinationof two or more.

[0030] The embodiments of the invention can be summarized as follows.

[0031] (1) A polishing-washing composition comprising a polishing mediaand a dispersion medium, characterized in that at least a part of thepolishing media is made of fine powder of an RB ceramic and or CRBceramic.

[0032] (2) A polishing-washing composition as recited in (1) above,wherein the polishing media further comprises, in combination, a finepowder of one or more members selected from the group consisting ofsilica, calcium oxide, aluminium oxide, silicon nitride, siliconcarbide, cesium oxide, synthetic or natural diamond, a metal silicide,tungsten oxide, titanium nitride and titanium oxide.

[0033] (3) A polishing-washing composition as recited in (2) above,wherein the ratio by weight of the fine powder of the RB ceramic and/orCRB ceramic to the fine powder of one or more members selected from thegroup consisting of silica, calcium oxide, aluminium oxide, siliconnitride, silicon carbide, cesium oxide, synthetic or natural diamond, ametal silicide, tungsten oxide, titanium nitride and titanium oxide inthe polishing media ranges 30 to 90: 70 to 10.

[0034] (4) A polishing-washing composition as recited in any one of 1 to3 above, wherein the fine powder of the RB ceramic and/or CRB ceramichas an average particle size of 1 μm to 1,000 μm.

[0035] (5) A polishing-washing composition as recited in any one of 1 to4 above, wherein the dispersion medium for the polishing media is madeof an aqueous dispersion medium containing a surface active agent.

[0036] (6) A polishing-washing composition as recited in any one of 1 to5 above, wherein the dispersion medium for the polishing media comprisespotassium chloride, ammonium chloride, sodium sulfate or a combinationthereof as an auxiliary additive.

[0037] (7) A polishing-washing composition as recited in any one of 1 to6 above, wherein the dispersion medium for the polishing media has aspecific gravity of about 1.1 to 1.4.

EXAMPLE 1

[0038] (Preparation of CRB Ceramic)

[0039] 75 kg of defatted bran derived from rice bran and 25 kg of aliquid phenolic resin (resol) were mixed and kneaded while heating to50° C. to 60° C. A plastic, homogeneous mixture was obtained.

[0040] The mixture was subjected to a primary baking at 900° C. in anitrogen atmosphere in a rotary kiln for 60 minutes. Subsequently, abaked compact obtained was screened through a 100 mesh sieve, therebyobtaining carbonized powders 50 to 250 μm in particle diameter.

[0041] 75 kg of thus obtained carbonized powder was mixed and kneadedwith 25 kg of a solid phenolic resin (resol) while heating to 100° C. to150° C. A plastic homogeneous mixture was obtained.

[0042] (Preparation of Polishing Media)

[0043] Next, the plastic compact was pressure formed into a round bodyhaving a diameter of 3 cm at a pressure of 20 Mpa. The die was set at atemperature of 150° C.

[0044] The molded compact was removed from the die, and was heated to atemperature of 500° C. in an atmosphere of nitrogen at a heating rate of1° C./minute and maintained at 500° C. for controller 60 minutes,followed by baking at 900° C. for about 120 minutes.

[0045] Subsequently, the temperature was lowered at a cooling rate of 2to 3° C./minute until reaching 500° C., and upon the temperaturedropping below 500° C., they were left to cool by themselves.

[0046] The round body having a diameter of 3 cm was placed in a crusherand crushed into pieces. The pieces were more finely crushed by use of aball mill.

[0047] In this way, primary fine particles of the CRB ceramic having anaverage size of 5 to 10 μm were obtained.

[0048] (Preparation of a Stock Solution of a Polishing Media SolutionComposition)

[0049] 2 kg of the primary fine particles of the CRB ceramic having abulk density of 1.23 and an average size of 5 μm, optical filters 2.5 kgof water, 1.5 kg of potassium chloride, 1.0 kg of sodium sulfate, and0.4 kg of potassium laurate serving as an anionic surface active agentwere mixed at room temperature and subjected to a ball mill therebypreparing a polishing media solution composition in the form of ahomogenous slurry.

[0050] (Preparation of Polishing Media Solution Composition)

[0051] The stock solution in the form of the homogeneous slurry wascarried to the spot where polishing-washing was performed, and 7.5 kg ofwater was added to the stock solution and agitated until a uniformcomposition was obtained to prepare a polishing media solutioncomposition. The dispersion medium for the polishing media had aspecific gravity of about 1.23.

[0052] (Polishing-Washing with a Water Jet)

[0053] As shown in FIG. 1, a polishing media solution composition 2 waspumped up from a storage tank 1, in which the polishing media solutioncomposition 2 was placed, by means of a pump 3, followed bypolishing-washing of worked portions 6, subjected to electricaldischarge machined, of a turbine blade 5 to be worked through a waterjet gun 4.

[0054] The polishing media solution composition 2 after thepolishing-washing was collected in a temporary storage tank 7 where aused polishing media solution composition was received. The thuscollected polishing media solution composition after thepolishing-washing contained the particles of metal oxides formed in thecourse of the working and the particles of removed burrs and the cuttingmetal chips. This was passed to a standing tank 9 by means of a pump 8.In the standing tank 9, the polishing media solution compositioncontaining the particles of the metal oxides formed upon the machiningand the particles of the removed burrs and the cutting metal chips wasallowed to stand over about 8 hours.

[0055] The particles of the metal oxides and the particles of theremoved burrs and the cutting metal chips, respectively, had a specificgravity of approximately 4.0 to 7.0. Because the RB ceramic and/or CRBceramic used as the polishing media of the invention has a bulk specificgravity of approximately 1.23 and the dispersion medium for thepolishing media also has a specific gravity of 1.23, only the particlesof the metal oxides and the particles of the removed burrs and thecutting metal chips were permitted to settle quickly. The polishingmedia solution composition containing the RB ceramic and/or CRB ceramicused as the polishing media of the invention was recycled from asupernatant liquid portion in the standing tank 9 to the storage tank 1by means of a recycling pump 12.

EXAMPLE 2

[0056] (Preparation of CRB Ceramic)

[0057] 75 kg of defatted bran derived from rice bran and 25 kg of aliquid phenolic resin (resol) were mixed and kneaded while heating to50° C. to 60° C. A plastic, homogeneous mixture was obtained.

[0058] The mixture was subjected to a primary baking at 900° C. in anitrogen atmosphere in a rotary kiln for 60 minutes. Subsequently, abaked compact obtained was screened through a 100 mesh sieve, therebyobtaining carbonized powders 50 to 250 μm in particle diameter.

[0059] 75 kg of thus obtained carbonized powder was mixed and kneadedwith 25 kg of a solid phenolic resin (resol) while heating to 100° C. to150° C. A plastic homogeneous mixture was obtained.

[0060] (Preparation of Polishing Media)

[0061] Next, the plastic compact was pressure formed into a round bodyhaving a diameter of 3 cm at a pressure of 20 Mpa. The die was set at atemperature of 150° C.

[0062] The molded compact was removed from the die, and was heated to atemperature of 500° C. in an atmosphere of nitrogen at a heating rate of1° C./minute and maintained at 500° C. for 60 minutes, followed bybaking at 550° C. for about 120 minutes.

[0063] Subsequently, the temperature was lowered at a cooling rate of 2to 3° C./minute until reaching 500° C., and upon the temperaturedropping below 500° C. they were left to cool by themselves.

[0064] The round body having a diameter of 3 cm was placed in a crusherand crushed into pieces. The pieces were more finely crushed by use of aball mill.

[0065] In this way, primary fine particles of the CRB ceramic having anaverage size of 5 to 10 μm were obtained.

[0066] (Preparation of a Stock Solution of a Polishing Media SolutionComposition)

[0067] 2 kg of the primary fine particles of the CRB ceramic having abulk density of 1.25 and an average size of 5 μm, silica fine powerhaving an average size of 5 μm, 3 kg of water, 1.5 kg of potassiumchloride, 1.5 kg of sodium sulfate, and 0.5 kg of potassium laurateserving as an anionic surface active agent were mixed at roomtemperature and subjected to a ball mill to prepare a stock solution ofa polishing media solution composition in the form of a homogenousslurry. The dispersion medium for the polishing media had a specificgravity of about 1.25.

[0068] (Polishing-Washing in a Ultrasonic Tank)

[0069] As shown in FIG. 1, a polishing media solution composition 2 waspumped up from a storage tank 1, in which the polishing media solutioncomposition 2 was placed, by means of a pump 3′, and placed in aultrasonic tank 7′ wherein ultrasonic vibrations were imposed by meansof a ultrasonic vibration device U. In the ultrasonic tank 7′, workedportions 6, which had been machined by electrical discharge, of aturbine blade 5 to be worked was subjected to polishing-washing.

[0070] The polishing media solution composition in the ultrasonic tank7′ which was used over a given time contained the particles of metaloxides formed upon working and the particles of removed burrs and thecutting metal chips. The solution was passed to a standing tank 9 bymeans of a pump 8′. In the standing tank 9, the polishing media solutioncomposition, which contained the particles of the metal oxide formedupon the working and the particles of the removed burrs and the cuttingmetal chips, was allowed to stand over about 6 hours.

[0071] The particles of the metal oxides and the particles of theremoved burrs and the cutting metal chips were found to have a specificgravity of about 4.0 to 7.0, respectively. Because the RB ceramic and/orCRB ceramic used as the polishing media of the invention has a bulkspecific gravity of approximately 1.25 and the dispersion medium for thepolishing media also has a specific gravity of about 1.23, only theparticles of the metal oxides and the particles of the removed burrs andthe cutting metal chips were permitted to settle quickly. The polishingmedia solution composition containing the RB ceramic and/or CRB ceramicused as the polishing media of the invention was recycled from asupernatant liquid portion in the standing tank 9 to the storage tank 1by means of a recycling pump 12.

EXAMPLE 3

[0072] (Preparation of RB Ceramic)

[0073] 75 kg of defatted bran derived from rice bran and 25 kg of aliquid phenolic resin (resol) were mixed and kneaded while heating to50° C. to 60° C. A plastic homogeneous mixture was obtained.

[0074] The mixture was subjected to a primary baking at 900° C. in anitrogen atmosphere in a rotary kiln for 60 minutes. Subsequently, abaked compact obtained was screened through a 100 mesh sieve, therebyobtaining carbonized powders 50 to 250 μm in particle diameter.

[0075] (Preparation of Polishing Media)

[0076] Next, the carbonized compact was more finely crushed by use of aball mill to obtain primary fine particles of the RB ceramic having anaverage size of 5 to 15 μm.

[0077] (Preparation of a Stock Solution of a Polishing Media SolutionComposition)

[0078] 2 kg of the primary fine particles of the RB ceramic having abulk density of 1.30 and an average size of 5 μm, 2 kg of a silica finepowder having an average size of 3 μm, 3 kg of water, 1.0 kg ofpotassium chloride, 2.1 kg of sodium sulfate, and 0.5 kg of potassiumlaurate serving as an anionic surface active agent were mixed at roomtemperature and subjected to a ball mill to prepare a stock solution ofa polishing media solution composition in the form of a homogenousslurry.

[0079] (Preparation of Polishing Media Solution Composition)

[0080] The stock solution in the form of the homogeneous slurry wascarried to the spot where polishing-washing was performed, and 7.0 kg ofwater was added to the stock solution and agitated until a uniformcomposition was obtained to prepare a polishing media solutioncomposition. The dispersion medium for the polishing media had aspecific gravity of about 1.29.

[0081] (Polishing-Washing with Water Jet)

[0082] As shown in FIG. 1, a polishing media solution composition 2 waspumped up from a storage tank 1, in which the polishing media solutioncomposition 2 was placed, by means of a pump 3, followed bypolishing-washing of portions 6, subjected to electrical dischargemachining, of a turbine blade 5 to be worked through a water jet gun 4.

[0083] The polishing media solution composition 2 after thepolishing-washing was collected in a temporary storage tank 7 where aused polishing media solution composition was received. The thuscollected polishing media solution composition after thepolishing-washing contained the particles of metal oxides formed in thecourse of the working and the particles of removed burrs and the cuttingmetal. This was passed to a standing tank 9 by means of a pump 8. In thestanding tank 9, the polishing media solution composition containing theparticles of the metal oxides formed upon the working and the particlesof the removed burrs and the cutting metal chips was allowed to standover about 8 hours.

[0084] The particles of the metal oxides and the particles of theremoved burrs and the cutting metal chips, respectively, had a specificgravity of approximately 4.0 to 7.0. Because the RB ceramic used as thepolishing media of the invention has a bulk specific gravity ofapproximately 1.30 and the dispersion medium for the polishing mediaalso has a specific gravity of approximately 1.29, the particles of themetal oxides, the particles of the removed burrs and the cutting metalchips and silica fine power were permitted to settle quickly. Thepolishing media solution composition containing the RB ceramic used asthe polishing media of the invention was recycled from a supernatantliquid portion in the standing tank 9 to the storage tank 1 by means ofa recycling pump 12.

[0085] A fresh silica fine powder was supplemented to the polishingmedial solution composition substantially in the same amount as theprecipitated silica fine powder, followed by continuing thepolishing-washing operations.

[0086] The contaminated surface polishing-washing detergent compositionaccording to the invention makes use of an RB ceramic and/or CRB ceramicwhich is an eco-friendly material, so that the surface of aprecision-worked surface can be efficiently polishing-washed. Aftercompletion of the polishing-washing, the particles of metal oxides andthe particles of removed burrs and the cutting metal chips can be simplyseparated from the polishing media solution composition by use of thedifference in specific gravity to provide a convenient contaminatedsurface polishing-washing detergent composition which can be re-used byrecycling thereof.

What is claimed is:
 1. A contaminated surface polishing-washingdetergent composition, characterized by comprising a polishing media anda dispersion medium wherein at least a part of the polishing medium ismade of fine powder of an RB ceramic and/or CRB ceramic.
 2. Thecontaminated surface polishing-washing detergent composition accordingto claim 1, wherein said polishing media further comprises, incombination, a fine powder of one or more members selected from thegroup consisting of silica, calcium oxide, aluminium oxide, siliconnitride, silicon carbide, cesium oxide, synthetic or natural diamond, ametal silicide, tungsten oxide, titanium nitride and titanium oxide. 3.The contaminated surface polishing-washing detergent compositionaccording to claim 2, wherein the ratio by weight of the fine powder ofthe RB ceramic and/or CRB ceramic to the fine powder of one or moremembers selected from the group consisting of silica, calcium oxide,aluminium oxide, silicon nitride, silicon carbide, cesium oxide,synthetic or natural diamond, a metal silicide, tungsten oxide, titaniumnitride and titanium oxide in the polishing medium ranges 30 to 90: 70to
 10. 4. The contaminated surface polishing-washing detergentcomposition according to any one of claims 1 to 3, wherein the finepowder of the RB ceramic and/or CRB ceramic has an average particle sizeof 1 μm to 1,000 μm.
 5. The contaminated surface polishing-washingdetergent composition according to any one of claims 1 to 4, wherein thedispersion medium for the polishing media is made of an aqueousdispersion medium containing a surface active agent.
 6. The contaminatedsurface polishing-washing detergent composition according to any one ofclaims 1 to 5, wherein the dispersion medium for the polishing mediacomprises potassium chloride, ammonium chloride, sodium sulfate or acombination thereof as an auxiliary additive.
 7. The contaminatedsurface polishing-washing detergent composition according to any one ofclaims 1 to 6, wherein the dispersion medium for the polishing media hasa specific gravity of about 1.1 to 1.4.